Apparatus for transferring a substrate in a lithography system

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United States of America

PATENT NO RE48903
SERIAL NO

16281179

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Abstract

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An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Boer Guido Leerdam, NL 42 242
De, Jong Hendrik Jan The Hague, NL 16 321
Kuiper, Vincent Sylvester The Hague, NL 28 84
Slot, Erwin Zoetermeer, NL 21 88
Van, Kervinck Marcel Nicolaas Jacobus The Hague, NL 25 77

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