Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 10, 2021
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N/A
app pub date -
Nov 29, 2018
filing date -
May 19, 2010
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Abstract
A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
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