Group III-nitride layers with patterned surfaces

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United States of America

PATENT NO RE47767
SERIAL NO

14757799

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Abstract

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A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

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Patent Owner(s)

Patent OwnerAddress
NOKIA OF AMERICA CORPORATION600-700 MOUNTAIN AVENUE MURRAY HILL NJ 07974-0636

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chowdhury, Aref Berkeley Heights, US 38 464
Ng, Hock Westfield, US 6 24
Slusher, Richart Elliott Lebanon, US 19 383

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1224171267333112101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6081 - 90100 +0100200300400500600700800900100011001200130014001500160017001800

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