Multi charged particle beam writing method and multi charged particle beam writing apparatus
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United States of America Patent
Stats
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Aug 6, 2019
Grant Date -
N/A
app pub date -
May 9, 2016
filing date -
May 9, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A multi charged particle beam writing method includes calculating first shot positions of multiple beams, each of which includes a distortion amount of an irradiating corresponding beam, in a case of irradiating each beam, based on control grid intervals, calculating first condition positions based on a pre-set condition, each of which is arranged in a corresponding first region surrounded by closest second shot positions of 2×2 in length and width of the first shot positions, calculating, for each of second regions respectively surrounded by closest second condition positions of the first condition positions, an area density of a figure pattern in overlapping with a second region concerned, calculating an irradiation amount or an irradiation time of each beam whose corresponding first shot position is in a corresponding second region, based on an area density, and writing a pattern by irradiating a beam of the calculated irradiation amount or time.
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International Classification(s)
- 2016 Application Filing Year
- H01J Class
- 2255 Applications Filed
- 1758 Patents Issued To-Date
- 77.97 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- H01J Class
- 40.21 % this patent is cited more than
- 6 Age
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