Imprint pattern forming method

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United States of America Patent

PATENT NO RE47093
SERIAL NO

15292073

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Abstract

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An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.

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Patent Owner(s)

Patent OwnerAddress
KIOXIA CORPORATION1-21 SHIBAURA 3-CHOME MINATO-KU TOKYO 108-0023

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inanami, Ryoichi Yokohama, JP 55 354
Tokue, Hiroshi Yokohama, JP 17 50
Yoneda, Ikuo Yokohama, JP 55 576

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