Support for microelectronic, microoptoelectronic or micromechanical devices
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United States of America Patent
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Jun 4, 2013
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N/A
app pub date -
Apr 24, 2008
filing date -
Jul 20, 2001
priority date (Note) -
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Abstract
The specification teaches a device for use in the manufacturing of microelectronic, microoptoelectronic or micromechanical devices (microdevices) in which a contaminant absorption layer improves the life and operation of the microdevice. In a preferred embodiment the invention includes a mechanical supporting base, and discrete deposits of gas absorbing or contaminant removing material on the base by a variety of techniques and a layer for temporary protection of the contaminant removing material on top of the contaminant removing material. Passages are created in the layer which expose the contaminant removing material to atmosphere. The device may be used as a covering for the microdevice as well.
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