Electronic cigarette atomizer
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United States of America Design
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Sep 26, 2023
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Aug 26, 2021
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Nov 21, 2018
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SHENZHEN VERDEWELL TECHNOLOGY LIMITED | NO 6-1 DONGCAI INDUSTRIAL ZONE GUSHU COMMUNITY XIXIANG STREET BAO'AN DISTRICT SHENZHEN GUANGDONG 518102 |
International Classification(s)

- 2021 Application Filing Year
- 2702 Class
- 199 Applications Filed
- 199 Patents Issued To-Date
- 100 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Wang, Jianliang | Guangdong, CN | 40 | 750 |
# of filed Patents : 40 Total Citations : 750 |
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Patent Citation Ranking
- 4 Citation Count
- 2702 Class
- 76.32 % this patent is cited more than
- 2 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Mar 26, 2027 |
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Mar 26, 2031 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 26, 2035 |
Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge - 3.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent No: 6947224
Methods to make diffractive optical elements
Abstract
A method for forming a diffractive lens includes forming an etch stop layer on a first surface of a silicon substrate, forming a diffractive optical element above the etch stop layer, forming a planarization layer covering the diffractive optical element, planarizing the planarization layer, forming a bonding layer on the planarization layer, bonding a transparent substrate on the bonding layer, and etching a second surface of the silicon substrate to the etch stop layer to remove a portion of the silicon substrate opposite the diffractive optical element, wherein the remaining portion of the silicon substrate forms a bonding ring.
Description
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