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United States of America Design
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Nov 14, 2017
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N/A
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Feb 5, 2016
filing date -
Aug 6, 2015
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
FLUKE CORPORATION | 6920 SEAWAY BOULEVARD EVERETT WA 98203 |
International Classification(s)

- 2016 Application Filing Year
- 1004 Class
- 555 Applications Filed
- 555 Patents Issued To-Date
- 100 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Huang, Wei | Shanghai, CN | 1002 | 7727 |
# of filed Patents : 1002 Total Citations : 7727 |
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Patent Citation Ranking
- 5 Citation Count
- 1004 Class
- 0 % this patent is cited more than
- 8 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 14, 2025 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 14, 2029 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent No: 7462842
Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements
Abstract
The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.
Description
Claims
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Legal Events
Date | Code | Event | Description |
---|---|---|---|
Jan 07, 2013 | STCH | INFORMATION ON STATUS: PATENT DISCONTINUATION | free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
Dec 09, 2012 | FP | LAPSED DUE TO FAILURE TO PAY MAINTENANCE FEE | Effective Date: Dec 09, 2012 |
Dec 09, 2012 | LAPS | LAPSE FOR FAILURE TO PAY MAINTENANCE FEES | |
Jul 23, 2012 | REMI | MAINTENANCE FEE REMINDER MAILED | |
Dec 09, 2008 | I | Issuance | |
Jun 29, 2007 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:WEDOWSKI, MARCO;STIETZ, FRANK;MERTENS, BAS;AND OTHERS;REEL/FRAME:019504/0415;SIGNING DATES FROM 20040831 TO 20041015 Owner name: CARL ZEISS SMT AG, GERMANY |
Aug 31, 2006 | P | Published | |
Mar 14, 2006 | F | Filing | |
Mar 07, 2002 | PD | Priority Date |

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