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United States of America Design
Stats
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Aug 16, 2011
Grant Date -
N/A
app pub date -
Sep 7, 2010
filing date -
Sep 7, 2010
priority date (Note) -
In Force
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Abstract
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First Claim
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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FOREVER CO LTD | 1-3-19 SAKAE-CHO KAWAGUCHI-SHI SAITAMA 332-0017 |
International Classification(s)

- 2010 Application Filing Year
- 0703 Class
- 35 Applications Filed
- 35 Patents Issued To-Date
- 100 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Hirai, Akira | Kawaguchi, JP | 133 | 1382 |
# of filed Patents : 133 Total Citations : 1382 |
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Patent Citation Ranking
- 34 Citation Count
- 0703 Class
- 0 % this patent is cited more than
- 14 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent No: 9869934
Collector in an extreme ultraviolet lithography system with optimal air curtain protection
Abstract
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
Description
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