Method of manufacturing a mask
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United States of America Patent
Stats
-
Jun 19, 2018
Issued Date -
N/A
app pub date -
Apr 6, 2016
filing date -
Jul 31, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
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Abstract
A method of manufacturing a mask includes forming a first hole in a base material using a laser, the first hole penetrating through the base material from a first surface to a second surface different than the first surface, and expanding the first hole using an etchant to form a second hole.
First Claim
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- C03C:CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREO....
- B23P:OTHER WORKING OF METAL; COMBINED OPERATIONS; UNIVE....
- B23K:SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLA....
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
- C25F:PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIAL....
- B44C:PRODUCING DECORATIVE EFFECTS
- 2016 Application Filing Year
- C23C Class
- 3247 Applications Filed
- 2111 Patents Issued To-Date
- 65.02 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C23C Class
- 0 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 19, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 19, 2029 |
