Fabrication method of a stack of electronic devices

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United States of America Patent

PATENT NO 9997395
APP PUB NO 20170352583A1
SERIAL NO

15616568

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Abstract

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This method includes the following steps: a) providing a first structure successively including a substrate, an electronic device and a dielectric layer; b) providing a second structure successively including a substrate, an active layer, an intermediate layer, a first semiconducting layer and a porous second semiconducting layer; c) bonding the first and second structures by direct bonding between the dielectric layer and the porous second semiconducting layer; d) removing the substrate of the second structure so as to expose the active layer; e) adding dopants to the first semiconducting layer or to the active layer; f) irradiating the first semiconducting layer by a pulse laser so as to thermally activate the corresponding dopants.

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Patent Owner(s)

Patent OwnerAddress
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES25 RUE LEBLANC BAT LE PONANT 75015 PARIS 75015

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fenouillet-Beranger, Claire Voiron, FR 39 326
Gaillard, Frédéric-Xavier Voiron, FR 6 15
Mathieu, Benoit Grenoble, FR 12 16
Nemouchi, Fabrice Moirans, FR 38 306

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