Evaluation method, storage medium, exposure apparatus, exposure method, and method of manufacturing article
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United States of America Patent
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Jun 12, 2018
Issued Date -
Feb 16, 2017
app pub date -
Aug 3, 2016
filing date -
Aug 10, 2015
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Abstract
The present invention provides an evaluation method of evaluating optical characteristics of a projection optical system by obtaining, by a prediction formula, a predicted value for a fluctuation amount of the optical characteristics relative to an exposure period of a substrate via the projection optical system, the method comprising determining the prediction formula by using a dedicated pattern in which a plurality of marks are arranged in a matrix on an object plane of the projection optical system, wherein the determining includes selecting, from the plurality of marks, at least two marks located in an illuminated region to be formed on the object plane when exposing the substrate, and obtaining the prediction formula based on positions of images of the at least two marks formed on an image plane of the projection optical system.
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