Methods of patterning and making masks for three-dimensional substrates
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United States of America Patent
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Jun 12, 2018
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Apr 24, 2015
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Apr 25, 2014
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Abstract
The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.
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