Electrochemical etching apparatus
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United States of America Patent
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-
Jun 12, 2018
Issued Date -
N/A
app pub date -
Mar 24, 2015
filing date -
Sep 14, 2012
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An electroplating etching apparatus includes a power to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.
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Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C01B Class
- 31.00 % this patent is cited more than
- 7 Age
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