Light source and photolithography apparatus containing the same, calibrating apparatus and method
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United States of America Patent
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Jun 5, 2018
Issued Date -
Apr 28, 2016
app pub date -
Oct 15, 2015
filing date -
Oct 16, 2014
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Abstract
The present disclosure provides an extreme ultraviolet (EUV) light source. The EUV light source includes a droplet array with a plurality of nozzles arranged along a straight scanning direction, the plurality of nozzle sequentially and intermittently ejecting droplets downward to a radiating position; a laser source configured to generate at least two laser beams and scan the at least two laser beams along the straight scanning direction, the at least two laser beams alternately bombarding droplets arriving at the radiating position to form EUV light; and a condenser with a condenser mirror having a reflective ellipsoidal surface, configured to collect the EUV light and converge collected EUV light at a center of focus.
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