Solution for EUV power increment at wafer level
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 5, 2018
Issued Date -
N/A
app pub date -
Aug 30, 2016
filing date -
Jul 14, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present disclosure relates to a photolithography radiation source having an angled primary laser, and an associated method of formation. In some embodiments, the photolithography radiation source has a fuel droplet generator that provides fuel droplets to a source vessel along a first trajectory. A primary laser is configured to generate a primary laser beam along a second trajectory that intersects the first trajectory. The primary laser beam is configured to ignite a plasma from the plurality of fuel droplets that emits radiation. A collector mirror is configured to focus the radiation to an exit aperture of the source vessel. The primary laser beam does not intersect the exit aperture.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2016 Application Filing Year
- G21K Class
- 257 Applications Filed
- 196 Patents Issued To-Date
- 76.27 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- G21K Class
- 19.18 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 5, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 5, 2029 |
