Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the same
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United States of America Patent
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Jun 5, 2018
Issued Date -
Apr 27, 2017
app pub date -
Sep 2, 2016
filing date -
Oct 21, 2015
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Abstract
A pattern generating method includes, generating a first bit map from inputted pattern data. Characteristics of a plurality of beams for exposing a pattern on a substrate are analyzed, each of the plurality of beams being designated to correspond to one of a plurality of grids in the first bit map. The pattern data is corrected such that at least one of the plurality of beams is designated to expose at least a portion of the pattern on the substrate. A second bit map is generated from the corrected pattern data. The substrate is patterned using the plurality of beams according to the designation of the second bit map.
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