Chemically amplified resist material and resist pattern-forming method
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United States of America Patent
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Jun 5, 2018
Issued Date -
May 11, 2017
app pub date -
Nov 9, 2016
filing date -
Nov 9, 2015
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Abstract
A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating agent included in the generative component comprises a compound represented by the formula (B). RB3 and RB4 each independently represent a monovalent organic group, or taken together represent a cyclic structure together with the O—C—O. At least one of RB3 and RB4 comprises a halogen atom, a nitro group, a cyano group, a formyl group, a carbonyl group, a carboxy group, a sulfo group, a sulfonyl group or a combination thereof, or the cyclic structure having 4 to 30 ring atoms is a spiro cyclic structure, a fused cyclic structure or a bridged cyclic structure.
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