Pellicle for reticle and multilayer mirror

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United States of America Patent

PATENT NO 9989844
APP PUB NO 20170017150A1
SERIAL NO

15281056

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Abstract

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A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Deurne, NL 222 2976
Loopstra, Erik Roelof Eindhoven, NL 325 13468
Stevens, Lucas Henricus Johannes Eindhoven, NL 25 243
Van, Der Schoot Harmen Klaas Vught, NL 46 711
Van, Kampen Maarten Eindhoven, NL 16 132
Yakunin, Andrei Mikhailovich Eindhoven, NL 49 363

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