Crystallization substrate, crystallization container, crystallization device, and crystal producing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 5, 2018
Issued Date -
N/A
app pub date -
Jan 25, 2013
filing date -
Jan 31, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A crystallization substrate of the present invention includes a noble metal vapor-deposited film having an absorbance in a 500 to 1,000 nm wavelength range and formed in all or part of one surface of the substrate. The noble metal vapor-deposited film has an average thickness of 0.1 to 60 nm. The noble metal vapor-deposited film is a continuous film with a pit formed by vapor deposition in part of the film and surrounded by the continuous film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully