ALE smoothness: in and outside semiconductor industry

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United States of America Patent

PATENT NO 9984858
SERIAL NO

15253481

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Abstract

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Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanarik, Keren Jacobs Los Altos, US 36 2409
Lill, Thorsten Santa Clara, US 101 3753
Marks, Jeffrey Saratoga, US 108 5192
Pan, Yang Los Altos, US 310 4868
Shen, Meihua Fremont, US 71 2612
Tan, Samantha Fremont, US 49 3743
Wise, Richard Los Gatos, US 74 1883

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