Systems and methods for metering a dose volume of fluid used to treat microelectronic substrates
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United States of America Patent
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May 29, 2018
Issued Date -
N/A
app pub date -
Jul 31, 2015
filing date -
Jul 31, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
The disclosure relates to systems and methods for metering a dose volume of fluid that may be used to treat microelectronic substrates. The system enables precision dispensing of relatively small amounts of a liquid chemical into a chemical bath or processing chamber for microelectronic substrates. The dispensing device may include a fluid conduit with a plurality of actuation devices that may limit fluid communication between the actuation devices and store a portion of the fluid in expandable membrane. The actuation devices may push or pull the fluid within the fluid conduit when the expandable membrane expands or contracts. The configuration and operation of the actuation devices may enable the collection, isolation, and dispensing of the dose volume.
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International Classification(s)
- C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B05B:SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B81C:PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE M....
- F04B:POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
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