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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
AVIENT CORPORATION	33587 WALKER ROAD LEGAL DEPT - IP AVON LAKE OH 44012

International Classification(s)

• C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
• B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
• B29K:INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, ....
• C08L:COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
• C08K:USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUB....

• 2016 Application Filing Year
• C08J Class
• 2510 Applications Filed
• 1585 Patents Issued To-Date
• 63.15 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Koehnke, Nicholas	Dacula, US	1	4
# of filed Patents : 1 Total Citations : 4

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Patent Citation Ranking

• 0 Citation Count
• C08J Class

• 0 % this patent is cited more than
• 7 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Nov 29, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Nov 29, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 29, 2018	US,9981462,B2   US9981462B2	GRANTED PATENT AS SECOND PUBLICATION
August 18, 2016	US,20160237271,A1   US20160237271A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 6947224

Methods to make diffractive optical elements

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Abstract

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A method for forming a diffractive lens includes forming an etch stop layer on a first surface of a silicon substrate, forming a diffractive optical element above the etch stop layer, forming a planarization layer covering the diffractive optical element, planarizing the planarization layer, forming a bonding layer on the planarization layer, bonding a transparent substrate on the bonding layer, and etching a second surface of the silicon substrate to the etch stop layer to remove a portion of the silicon substrate opposite the diffractive optical element, wherein the remaining portion of the silicon substrate forms a bonding ring.

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Description

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Claims

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