Method for producing an aperture plate
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United States of America Patent
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May 29, 2018
Issued Date -
N/A
app pub date -
May 24, 2013
filing date -
Jun 11, 2012
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Abstract
A photo-resist is applied in a pattern of vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal into the spaces around the columns. There is further application of a second photo-resist mask of much larger (wider and taller) columns, encompassing the area of a number of first columns. The hole diameter in the second plating layer is chosen according to a desired flow rate.
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