Photo mask and exposure system
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United States of America Patent
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May 22, 2018
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app pub date -
Feb 16, 2016
filing date -
Sep 11, 2015
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Abstract
The present invention belongs to the field of semiconductor technology, and specifically provides a photo mask and an exposure system. The photo mask is provided with a patterning structure for forming a resulting pattern, the patterning structure comprising a strip-like main body for forming a rectilinear pattern, wherein the patterning structure further comprises a patterning structure auxiliary unit provided at two sides of the strip-like main body, the patterning structure auxiliary unit being capable of adjusting and compensating direction and intensity of light during exposure. With the photo mask, the resulting pattern formed through exposure using the photo mask has improved fineness, thereby improving accuracy of the formed rectilinear pattern.
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