Chemical control features in wafer process equipment
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 22, 2018
Issued Date -
N/A
app pub date -
Sep 14, 2015
filing date -
Sep 21, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully