Reflective mask and method for manufacturing reflective mask
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United States of America Patent
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May 22, 2018
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app pub date -
Aug 29, 2016
filing date -
Sep 14, 2015
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Abstract
A reflective mask comprises a substrate, first and second stacked bodies, and an intermediate portion. The first stacked body is provided on a surface of the substrate. The first stacked body includes a plurality of first layers and a plurality of second layers. A refractive index for a first electromagnetic ray of the first layer is different from a refractive index for the first electromagnetic ray of the second layer. The second stacked body includes a plurality of third layers and a plurality of fourth layers. A refractive index for the first electromagnetic ray of the third layer is different from a refractive index for the first electromagnetic ray of the fourth layer. A reflectance to the first electromagnetic ray of each of the first stacked body and the second stacked body is higher than a reflectance to the first electromagnetic ray of the intermediate portion.
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