Method for producing nitride single crystal

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United States of America Patent

PATENT NO 9976229
SERIAL NO

14500516

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Abstract

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A first object of the present invention is to provide a method for efficiently growing a nitride single crystal even under low pressure conditions. The present invention relates to a method for producing a nitride single crystal, comprising growing a nitride crystal on the surface of a seed crystal having a hexagonal crystal structure by setting a pressure in a reaction vessel having the seed crystal, a nitrogen-containing solvent, a mineralizer containing a fluorine atom, and a raw material placed therein to 5 to 200 MPa and performing control so that the nitrogen-containing solvent is in at least either a supercritical state or a subcritical state.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bao, Quanxi Miyagi, JP 5 5
Chichibu, Shigefusa Miyagi, JP 9 44
Ishiguro, Tohru Miyagi, JP 4 5
Kagamitani, Yuji Ibaraki, JP 13 402
Kayano, Rinzo Hokkaido, JP 13 51
Saito, Makoto Ibaraki, JP 389 6319
Tomida, Daisuke Miyagi, JP 2 4
Ueda, Mutsuo Hokkaido, JP 3 4
Yokoyama, Chiaki Miyagi, JP 3 6

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