Multi-dimensional art works and methods
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United States of America Patent
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May 22, 2018
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app pub date -
Jun 21, 2016
filing date -
Jun 21, 2016
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Abstract
In some embodiments, a method may include selectively applying a mask to a first surface of a substrate. The mask may include one or more components defining a selected pattern and having a non-uniform density. The method may further include etching the first surface of the substrate based on the mask and selectively processing the first surface of the substrate to produce a multi-dimensional artwork.
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