Diffusion bonded plasma resisted chemical vapor deposition (CVD) chamber heater
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United States of America Patent
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May 22, 2018
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N/A
app pub date -
Jan 13, 2014
filing date -
Jan 13, 2014
priority date (Note) -
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Abstract
Embodiments of the disclosure generally relate to heated substrate supports having a protective coating thereon. The protective coating is formed from pure yttria or alloys predominantly of yttria. The protective coating is diffusion bonded to the heater plate of the substrate support. Two distinct silicon containing layers are formed between the heater plate and the protective coating as the result of the diffusion bonding.
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