Semiconductor device including air spacer
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United States of America Patent
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May 15, 2018
Issued Date -
N/A
app pub date -
Sep 13, 2016
filing date -
Nov 27, 2015
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Abstract
A semiconductor device includes a substrate including a plurality of active areas. A conductive pattern is in contact with an active area. First and second conductive line structures face first and second side walls of the conductive pattern. An air spacer is disposed between the first and second side walls. The first and second conductive line structures include a conductive line and a conductive line mask layer. The conductive line mask layer includes a lower portion having a first width and an upper portion having a second width narrower than the first width. The air spacer includes a first air spacer disposed on a side wall of the lower portion of the conductive line mask layer and a second air spacer disposed on a side wall of the upper portion of the conductive line mask layer. The second air spacer is connected with the first air spacer.
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