Polymer compound, negative resist composition, laminate, patterning process, and compound
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United States of America Patent
Stats
-
May 15, 2018
Issued Date -
N/A
app pub date -
Jan 5, 2017
filing date -
Jan 25, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.
First Claim
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International Classification(s)
- 2017 Application Filing Year
- C08F Class
- 2524 Applications Filed
- 1863 Patents Issued To-Date
- 73.82 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- C08F Class
- 38.55 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 15, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 15, 2029 |
