MEMS device

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United States of America Patent

PATENT NO 9969609
SERIAL NO

15296821

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Abstract

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The present disclosure provides a method for forming micro-electro-mechanical-system (MEMS) devices. The method includes providing a plurality of wafers; bonding a front surface of at least a first wafer onto a front surface of a second wafer; trimming an edge of and thinning the at least first wafer after the at least first wafer is bonded onto the second wafer; and bonding a first supporting plate onto a front surface of a third wafer. The method further includes thinning a back surface of the third wafer and forming alignment marks on a thinned back surface of the third wafer; bonding a second supporting plate onto the thinned back surface of the third wafer according to the alignment marks; and removing the first supporting plate and bonding the at least first wafer onto the third wafer according to the alignment marks to form a stack structure.

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Patent Owner(s)

Patent OwnerAddress
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION201203 18 ZHANGJIANG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Xu, Wei Shanghai, CN 934 8439

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