Substrate processing apparatus, method for manufacturing semiconductor device, and non-transitory computer-readable recording medium

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United States of America Patent

PATENT NO 9966289
SERIAL NO

15024539

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Abstract

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An apparatus and method capable of reducing the footprint of substrate processing system. An apparatus includes a housing chamber including a housing cabinet which houses housing containers for housing substrates, and a housing container carrying mechanism provided on the ceiling of the housing chamber and configured to carry the housing containers.

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Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CORPORATION3-4 KANDAKAJI-CHO CHIYODA-KU TOKYO 101-0045

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kamimura, Daigi Toyama, JP 24 627
Komae, Yasuaki Toyama, JP 12 163
Morita, Osamu Toyama, JP 101 2365
Nogami, Takashi Toyama, JP 33 477
Odake, Shigeru Toyama, JP 9 474
Taniyama, Tomoshi Toyama, JP 72 2979

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