Pressurizing-type lamp annealing device, method for producing thin film, and method for using pressurizing-type lamp annealing device

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United States of America Patent

PATENT NO 9966283
SERIAL NO

13579394

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Abstract

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A pressurizing-type lamp annealing device which can easily handle a substrate to be treated having a large surface area. An embodiment of the pressurizing-type lamp annealing device includes: a treatment chamber (25); a holding part (23) disposed in the treatment chamber to hold a substrate to be treated; a gas-introduction mechanism for introducing a pressurized gas into the treatment chamber; a gas-discharge mechanism for discharging the gas in the treatment chamber; a transparent tube (20) disposed in the treatment chamber; and a lamp heater (19) placed in the treatment chamber to irradiate the substrate with a lamp light through the transparent tube.

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Patent Owner(s)

Patent OwnerAddress
KRYSTAL INC2-1-17 ASUTOPIA UBE-SHI YAMAGUCHI 755-0152

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honda, Yuuji Nagareyama, JP 53 491
Kijima, Takeshi Nagareyama, JP 167 1581
Suzuki, Mitsuhiro Nagareyama, JP 170 4451

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