Film forming method and film forming apparatus
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United States of America Patent
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May 8, 2018
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app pub date -
Sep 3, 2015
filing date -
Sep 5, 2014
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Abstract
There is provided a method of forming a film on a surface to be processed of a workpiece, the method including: accommodating the workpiece with a single-crystallized substance formed on the surface to be processed, into a processing chamber; supplying a crystallization suppressing process gas into the processing chamber such that a crystallization of the single-crystallized substance formed on the surface to be processed is suppressed; and supplying a source gas into the processing chamber to form an amorphous film on the surface to be processed of the workpiece.
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