Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image
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United States of America Patent
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May 8, 2018
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Nov 17, 2016
filing date -
Dec 9, 2015
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Abstract
A multi charged particle beam apparatus includes a forming aperture array substrate, where there are formed a plurality of first openings and a plurality of second openings on the periphery of the whole plurality of first openings, each being larger than each of the plurality of first openings, to form multi-beams by the plurality of first openings, and to be able to form a plurality of calibration beams by the plurality of second openings, a shutter to select, one by one, one of the plurality of calibration beams formed by passing through the plurality of second openings, in accordance with a slide position, and a detector to detect a secondary electron including a reflected electron generated by scanning a mark by deflecting the selected calibration beam, in the state of all the multi-beams controlled to be OFF.
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