Mask substrate structure

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United States of America Patent

PATENT NO 9964847
SERIAL NO

15187126

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Abstract

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The present disclosure relates to lithographic masks and, more particularly, to a lithographic mask substrate structure and methods of manufacture. The mask includes a sub-resolution assist feature (SRAF) formed on a quartz substrate and composed of a patterned transition film and absorber layer.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES U S INC400 STONEBREAK ROAD EXTENSION MALTA NY 12020

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lawliss, Mark S Essex Junction, US 1 0
Reid, A Gary Burlington, US 4 4
Wistrom, Richard Essex Junction, US 2 3

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