Cleaning of CVD production spaces

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United States of America Patent

PATENT NO 9962745
SERIAL NO

14783858

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Abstract

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Contamination of surfaces of polysilicon rods removed from a Siemens reactor in a polysilicon production facility is reduced by cleaning the production facility at least every other week with a cleaning liquid containing water, optionally also containing neutral surfactants.

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Patent Owner(s)

Patent OwnerAddress
WACKER CHEMIE AGGISELA-STEIN-STR 1 81671 MÜNCHEN 81737

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hertlein, Harald Burghausen, DE 15 134
Popp, Friedrich Ooltewath, US 11 28

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