Methods and systems for fast imprinting of nanometer scale features in a workpiece
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United States of America Patent
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May 1, 2018
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app pub date -
Sep 27, 2013
filing date -
Sep 27, 2012
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Abstract
The subject matter described herein relates to methods and systems for fast imprinting of nanometer scale features in a workpiece. According to one aspect, a system for producing nanometer scale features in a workpiece is disclosed. The system includes a die having a surface with at least one nanometer scale feature located thereon. A first actuator moves the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece.
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