Method and apparatus for continuous removal of sub-micron sized particles in a closed loop liquid flow system
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United States of America Patent
Stats
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May 1, 2018
Issued Date -
N/A
app pub date -
Jul 20, 2015
filing date -
Aug 25, 2009
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method and apparatus for continuous removal of sub-micron sized particles and other materials attached thereto such as cancer cells and bacteria from blood and other liquids. A centrifuge rotor having a curved shape is offset on a spinning rotor base and creates contiguous areas of low to high centrifugal force depending on the distances from the axis of the rotor base. This creates a density gradient field that separates materials of different densities input to the centrifuge that exit via different outputs. A monitor detects components of the fluid that are mixed with the particles before they exit the centrifuge. If there are any unwanted components detected with the particles logic circuitry changes the speed of rotation of the rotor, and the flow rate of pumps inputting and removing separated fluid and particles to and from the centrifuge until there are no unwanted components in the fluid exiting with the particles from the centrifuge.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
NANOSHELL COMPANY LLC | 529 SPRINGRIDGE DR NORTH SALT LAKE NM 84054 |
International Classification(s)

- 2015 Application Filing Year
- A61K Class
- 16157 Applications Filed
- 11882 Patents Issued To-Date
- 73.55 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Mizukami, Hiroshi | Pasadena, US | 74 | 688 |
# of filed Patents : 74 Total Citations : 688 | |||
Ostafin, Agnes | North Salt Lake, US | 12 | 69 |
# of filed Patents : 12 Total Citations : 69 |
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Patent Citation Ranking
- 3 Citation Count
- A61K Class
- 50.93 % this patent is cited more than
- 7 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Nov 1, 2025 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Nov 1, 2029 |
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Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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Aug 15, 2023 | I | Issuance | |
Mar 29, 2021 | F | Filing | |
Mar 29, 2021 | FEPP | FEE PAYMENT PROCEDURE | free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
Nov 30, 2015 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LEE, DO YUN;KIM, SANG WOOK;REEL/FRAME:063899/0668 Owner name: SAMSUNG ELECTRONICS CO., LTD, KOREA, REPUBLIC OF Effective Date: Nov 30, 2015 |
Dec 04, 2014 | PD | Priority Date |

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