Method for repairing a mask
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United States of America Patent
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Apr 24, 2018
Issued Date -
N/A
app pub date -
Mar 21, 2016
filing date -
Oct 11, 2013
priority date (Note) -
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Abstract
A method for repairing a mask includes receiving a mask having first and second defective regions. A first treatment is performed to the mask. After performing the first treatment, a first repair process is performed on the mask. The first defective region is repaired to form a first repaired defective region. A second treatment is performed to the mask, including the first repaired defective region. After performing the second treatment, a second repair process is performed on the mask. The second defective region is repaired to form a second repaired defective region.
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