Photomask blank, making method, and photomask
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United States of America Patent
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Apr 24, 2018
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app pub date -
Sep 2, 2016
filing date -
Sep 18, 2015
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Abstract
A photomask blank comprising a transparent substrate (1), an etching stop film (2), a light-shielding film (3), and an etching mask film (4) has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film (2) consists of a first layer (21) which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer (22) functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.
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