Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

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United States of America Patent

PATENT NO 9946161
SERIAL NO

13660146

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Abstract

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An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Deguenther, Markus Aalen, DE 127 1347
Dittmann, Olaf Bopfingen, DE 18 240
Gruner, Toralf Aalen-Hofen, DE 173 1727
Korb, Thomas Schwaebisch Gmuend, DE 58 72
Major, Andras G Oberkochen, DE 17 134
Saenger, Ingo Heidenheim, DE 31 111
Scharnweber, Ralf Aalen, DE 11 143
Vogt, Martin Mutlangen, DE 46 279
Waldis, Severin Bern, CH 14 128
Wangler, Johannes Koenigsbronn, DE 105 1917
Weiss, Gundula Aalen, DE 9 70

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