Spacer and manufacturing device for the same

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United States of America Patent

PATENT NO 9946154
SERIAL NO

14888418

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Abstract

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A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Wherein, light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, a flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTDNO 9-2 TANGMING RD GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guo, Jinbo Guangdong, CN 24 80
Liu, Huan Guangdong, CN 181 1449
Lo, Shih-hsun Guangdong, CN 33 145
Wang, Zui Guangdong, CN 41 63

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