X-ray laser microscopy system and method
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United States of America Patent
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Apr 17, 2018
Issued Date -
N/A
app pub date -
Sep 23, 2017
filing date -
Jul 23, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. The sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, and exposed to brief bursts of coherent X-ray illumination further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from a sample is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same sample can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the sample. Methods to further improve performance, such as concave or curved detectors, improved temperature control, and alternative X-ray optics are also disclosed.
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International Classification(s)
- 2017 Application Filing Year
- G21K Class
- 261 Applications Filed
- 176 Patents Issued To-Date
- 67.44 % Issued To-Date
Cited Art Landscape
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- 0 Citation Count
- G21K Class
- 0 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Oct 17, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 17, 2029 |
