Electrostatic discharge protection apparatus and process

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United States of America Patent

PATENT NO 9941239
SERIAL NO

15345134

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Abstract

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In a process, at least one circuit element is formed in a substrate. A conductive layer is formed over the substrate and in electrical contact with the at least one circuit element. Electrostatic charges are discharged from the substrate via the conductive layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Wen-Chien Hsinchu, TW 7 12
Chen, Dai-Jang New Taipei, TW 8 85
Lin, Chih-Hsien Tai-Chung, TW 64 661
Lu, Hsiang-Tai Zhubei, TW 44 329

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