Method for producing a reflection-reducing layer system and reflection-reducing layer system

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United States of America Patent

PATENT NO 9939556
SERIAL NO

15008392

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Abstract

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A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

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Patent Owner(s)

Patent OwnerAddress
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E VMUNICH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Füchsel, Kevin Jena, DE 3 10
Heiβe, Hanno Jena, DE 1 2
Kaiser, Norbert Jena, DE 33 257
Knopf, Heiko Jena, DE 3 10
Munzert, Peter Jena, DE 20 131
Rickelt, Friedrich Jena, DE 9 41
Schulz, Ulrike Jena, DE 26 158

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