Wafer processing bonding arrangement, wafer laminate, and thin wafer manufacturing method

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United States of America Patent

PATENT NO 9934996
SERIAL NO

15232175

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Abstract

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A bonding arrangement comprising a silicone-base adhesive composition is suited for temporarily bonding a wafer to a support for wafer processing. The bonding arrangement includes a first temporary bond layer of non-silicone thermoplastic resin, and a second temporary bond layer of thermosetting silicone polymer and/or a third temporary bond layer of thermosetting siloxane-modified polymer. The second and/or third bond layer contains an antistatic agent.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sugo, Michihiro Annaka, JP 83 636
Tagami, Shohei Annaka, JP 39 315
Tanabe, Masahito Annaka, JP 35 480
Yasuda, Hiroyuki Annaka, JP 163 1048

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