Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure

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United States of America Patent

PATENT NO 9934944
SERIAL NO

15210115

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Abstract

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In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA TOSHIBAKANAGAWA KANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akita, Masato Kanagawa, JP 44 173
Sanada, Yasushi Kanagawa, JP 12 174
Ui, Akio Tokyo, JP 34 1012

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